Thermal scanning probe lithography (tSPL) is becoming more important in the nanolithography community. To go to the next level, upscaling of the NanoFrazor technology and processes to larger areas, operating with inert environments, and increasing throughput via parallelization needs to be realized.
Thermal scanning probe lithography (tSPL) is becoming more important in the nanolithography community. To go to the next level, upscaling of the NanoFrazor technology and processes to larger areas, operating with inert environments, and increasing throughput via parallelization needs to be realized.